RET Teaching Module 2: Wet Chemical Etching of Silicon
Authored by:
Terry Koker
Mahomet-Seymour High School,
Mahomet, Illinois
Year in Program:
2014-2015
Designed For:
High School Students
Overview
Students will use the photo-assisted etching of p-type silicon with potassium hydroxide solution to study principles of electronics manufacturing and chemical kinetics.
After completing this module, student should be able to:
- describe the role of wet-chemical etching in semiconductor manufacturing.
- describe the promotion of electrons in the band-gap region of p-type and n-type silicon.
- analyze the effects of environmental variables on the rate of a chemical reaction.
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Included in this Module:
- Teacher Guide
- Module Lessons - Low-Cost Photochemical Etching with a Projector
- Demonstration Video
Samples of the materials
>> Download the zip file with all content for this module